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| 论文题目: | CO2 plasma treatment to prepare the rear emitter with a boron-doped hydrogenated amorphous/nanocrystalline silicon stack for a high-efficiency silicon heterojunction solar cell |
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| 作者: | Lilan Wen, Lei Zhao*, Guanghong Wang, Xiaojie Jia, Xiaohua Xu, Xiaotong Li, Shiyu Qu, Xianyang Zhang, Yuhua Zuo*, Ke Xin, Xinyi Zhang, Zhigang Mei, Jihong Xiao, Su Zhou, Wenjing Wang |
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| 刊物名称: | ACS Applied Materials and Interfaces |
| 年: | 2025 |
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CO2 plasma treatment to prepare the rear emitter with a boron-doped hydrogenated amorphous/nanocrystalline silicon stack for a high-efficiency silicon heterojunction solar cell